Sascha Migura and Smt Gmbh - Free people check

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CARL ZEISS SMT GMBH, Aalen-Unterrombach, DE

Optics for EUV Lithography Carl Zeiss SMT GmbH, Sascha ...fdocument.org › Documents

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Sascha Migura, Carl Zeiss SMT GmbH, Oberkochen, Germany2018 EUVL Workshop2Carl Zeiss SMT GmbH, Sascha Migura EUVL ...

Euv Lithography - freeebooksczwauhe.ml

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Optics for EUV Lithography June 13 th, · Berkeley, CA, USA Dr. Sascha Migura, Carl Zeiss. SMT GmbH, Oberkochen, Germany EUVL Workshop.

High-NA EUV lithography enabling Moore’s law in the next decade |...

spie.org

... Carl Zeiss SMT GmbH (Germany) Sascha Migura, Carl Zeiss SMT GmbH (Germany) Jens Timo Neumann, Carl Zeiss Oberkochen (Germany) ...

High-NA EUV lithography exposure tool progress - SPIEspie.org › Publications › Proceedings › Paper

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... Carl Zeiss SMT GmbH (Germany) Bernhard Kneer, Carl Zeiss SMT GmbH (Germany) Sascha Migura, Carl Zeiss SMT GmbH (Germany) ...

All web results to the name "Sascha Migura"

P22.pdf Optics for EUV Lithography June 13th,

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P22.pdf. Optics for EUV Lithography June 13th, · Berkeley, CA, USA Dr. Sascha Migura, Carl Zeiss SMT GmbH, Oberkochen, Germany EUVL Work...

DE A1 - Imaging optics for use in optical system of...

patents.google.com

... Sascha Migura: Candidato: Carl Zeiss Smt Gmbh: Esporta citazione: BiBTeX, EndNote, RefMan: Citazioni di brevetti (6), Con riferimenti in (4), Classificazioni (5 ...

US A1 - Mirror for euv wavelengths, projection objective...

patents.google.com

Inventors, Hans-Jochen Paul, Gerhard Braun, Sascha Migura, Aurelian Dodoc, Christoph Zaczek. Original Assignee, Carl Zeiss Smt Gmbh. Export Citation ...

US B2 - Reflective mask for EUV lithography Google...

patents.google.com

Erfinder, Vladimir Kamenov, Sascha Migura. Ursprünglich Bevollmächtigter, Carl Zeiss Smt Gmbh. Zitat exportieren, BiBTeX, EndNote, RefMan. Patentzitate (13) ...

Deflection mirror and projection exposure apparatus for ...

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Carl Zeiss SMT GmbH - Danny Chan, Hans-Juergen Mann, Sascha Migura. Application US - Filed year: Mirror for use in a microlithography projection ...

High-NA EUV lithography enabling Moore s law in the next ...hobbydocbox.com › Photography › High-n...

hobbydocbox.com

Optics for EUV Lithography Dr. Sascha Migura, Carl Zeiss SMT GmbH, Oberkochen, Germany EUVL Workshop June 13 th, Berkeley, CA, USA The ...

WO A1 - Mirror for the euv wavelength range, projection...

patents.google.com

Изобретатели, Hans-Jochen Paul, Gerhard Braun, Sascha Migura, Aurelian Dodoc, Christoph Zaczek. Кандидат, Carl Zeiss Smt Gmbh. Експортиране на ...

US A1 - Reflective mask for euv lithography

patents.google.com

Sascha Migura. Applicant. Carl Zeiss Smt Gmbh. U.S. Classification · International Classification. G03F · G03B External Links. USPTO ...

MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS -...

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Sascha Migura, Aalen-Unterrombach DE. Patent applications by CARL ZEISS SMT GMBH. Patent applications in class ...

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Sascha Migura and Smt Gmbh Free People Check