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Sascha MIGURA - Patents
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Recent bibliographic sampling of Sascha MIGURA patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title): ...
Business Profiles
patentbuddy: Sascha Migura
CARL ZEISS SMT GMBH, Aalen-Unterrombach, DE
Books & Literature
Nstar2007: Proceedings of the 11th Workshop on The Physics of Excited...
books.google.de
Calculations were performed by Tim van Cauteren, Christian Haupt, Simon Kreuzer and Sascha Migura. This work was partially supported by the EU III “ Hadron ...
Weak and Strong Baryon Decays in a Constituent Quark Model - Sascha...
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Sascha Migura pages. 0 Reviewshttp://books.google.com/books/about/Weak_and_Strong_Baryon_Decays_in_a_Const.html?id=lUHDtgAACAAJ ...
Weak and Strong Baryon Decays in a Constituent Quark Modelbooks.google.com › books › about › Weak_and_Strong_...
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Title, Weak and Strong Baryon Decays in a Constituent Quark Model. Author, Sascha Migura. Published, Length, 126 pages. Export Citation, BiBTeX ...
Related Documents
[hep-ph ] Charmed baryons in a relativistic quark model
arxiv.org
Submission history From: Sascha Migura Thu, 16 Feb :06:35 GMT (61kb) [v2] Fri, 30 Jun :56:19 GMT (62kb)
CiteSeerX
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CiteSeerX - Document Details (Isaac Councill, Lee Giles, ... {Sascha Migura and Dirk Merten and Bernard Metsch and Herbert-r. Petry}, title = {}, year = {2006}}
Optics for EUV Lithography Carl Zeiss SMT GmbH, Sascha ...fdocument.org › Documents
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Sascha Migura, Carl Zeiss SMT GmbH, Oberkochen, Germany2018 EUVL Workshop2Carl Zeiss SMT GmbH, Sascha Migura EUVL ...
[hep-ph v1] Semileptonic decays of baryons in a relativistic...
arxiv.org
· Authors: Sascha Migura, Dirk Merten, Bernard Metsch, Herbert-R. Petry (Submitted on 16 Feb (this version), latest version 30 Jun )
Scientific Publications
LandOfFree - Scientist - Sascha Migura
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Publications
- CORE
core.ac.uk
Sascha Migura . By Sascha Migura, Dirk Merten, Bernard Metsch and Herbert-r. Petry. Abstract. EPJ manuscript No. (will be inserted by the editor) Semileptonic decays ...
Study of [equation] five quark system with three kinds of quark-quark...
link.springer.com
Study of \(qqqc\bar c\) five quark system with three kinds of quark-quark hyperfine interaction S. G. Yuan, K ... Sascha Migura, Dirk Merten, ...
Charmed - CORE
core.ac.uk
By Sascha Migura, Dirk Merten, Bernard Metsch and Herbert-r Abstract. EPJ manuscript No. Publisher:
EUV Lithography, Second Edition | (2018) | Bakshi | Publications |...
spie.org
5 Optical Systems for EUVL: Sascha Migura, Winfried Kaiser, Jens Timo Neumann, Hartmut Enkisch, and Dirk Hellweg: 5.1 Introduction:
Miscellaneous
P22.pdf Optics for EUV Lithography June 13th,
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P22.pdf. Optics for EUV Lithography June 13th, · Berkeley, CA, USA Dr. Sascha Migura, Carl Zeiss SMT GmbH, Oberkochen, Germany EUVL Work...
DE A1 - Imaging optics for use in optical system of...
patents.google.com
... Sascha Migura: Candidato: Carl Zeiss Smt Gmbh: Esporta citazione: BiBTeX, EndNote, RefMan: Citazioni di brevetti (6), Con riferimenti in (4), Classificazioni (5 ...
WO A1 - Projection objective having mirror elements with...
patents.google.com
An optical system comprises a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image...
US A1 - Mirror for use in a microlithography projection...
patents.google.com
A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate...
Sascha Migura, Aalen-Unterrombach DE - Patent applications
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Patent application number Description Published; : PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS - An optical system is disclosed ...
DE A1 - Reflektives optisches Abbildungssystem
patents.google.com
Other languages: English; Inventor: Gerhard Braun: Aurelian Dodoc: Hans-Jürgen Mann: Sascha Migura: Hans-Jochen Paul: Christoph Zaczek; Current ...
US A1 - Projection objective having mirror elements with...
patents.google.com
An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object...
EP B1 - Projection objective having mirror elements with...
patents.google.com
... PCT/EP , PCT/EP , PCT/EP , PCT/EP , PCT/EP Inventeurs, Danny Chan, Hans-Jürgen Mann, Sascha Migura.
New States Containing Charm at BABAR - ppt downloadslideplayer.com › slide
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6 Λc(2940)+ Sascha Migura et al. hep-ph/ hep-ex/ Three Λc states predicted at mass ~2940 MeV/c2: JP= (1/2)+, (1/2)–, and (3/2)– The Λc(2880)+ is near a ...
Internet Archive Search: creator:"Sascha Migura"
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Charmed baryons in a relativistic quark model - Sascha Migura We calculate mass spectra of charmed baryons within a relativistically covariant quark model ...
US A1 - Mirror for euv wavelengths, projection objective...
patents.google.com
Inventors, Hans-Jochen Paul, Gerhard Braun, Sascha Migura, Aurelian Dodoc, Christoph Zaczek. Original Assignee, Carl Zeiss Smt Gmbh. Export Citation ...
US A1 - Reflective optical imaging system Google...
patents.google.com
An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with...
DE A1 - Spiegel zur Verwendung in einer...
patents.google.com
Die Erfindung betrifft einen Spiegel zur Verwendung in einer Mikrolithographie-Projektionsbelichtungsanlage, der ein Substrat und eine reflektive Beschichtung...
in:(Sascha Migura)—众信专利检索系统
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序号, 申请号, 专利名称, 公开（公告）号, 公开（公告）日, 申请日, 申请(专利权)人, 发明人, 法律信息. 1, PCT/EP · PROJECTION EXPOSURE APPARATUS ...
US B2 - Reflective mask for EUV lithography Google...
patents.google.com
Erfinder, Vladimir Kamenov, Sascha Migura. Ursprünglich Bevollmächtigter, Carl Zeiss Smt Gmbh. Zitat exportieren, BiBTeX, EndNote, RefMan. Patentzitate (13) ...
WO A2 - Reflective mask for euv lithography
patents.google.com
... WO A2, WO-A , WO A2, WO A2, WO A2. Inventores, Vladimir Kamenov, Sascha Migura.
WO A1 - Mirror for the euv wavelength range, projection...
patents.google.com
Изобретатели, Hans-Jochen Paul, Gerhard Braun, Sascha Migura, Aurelian Dodoc, Christoph Zaczek. Кандидат, Carl Zeiss Smt Gmbh. Експортиране на ...
EUV lithography optics for sub-9nm resolution
www.spiedigitallibrary.org
SPIE Digital Library Proceedings
US A1 - Reflective mask for euv lithography
patents.google.com
Sascha Migura. Applicant. Carl Zeiss Smt Gmbh. U.S. Classification · International Classification. G03F · G03B External Links. USPTO ...
2018 EUVL Workshop Update | EUVL Focus - Solid State Technology
electroiq.com
Sascha Migura of Zeiss gave an overview of Zeiss' progress in optics to get the latest EUVL scanner ready, as well as his continuing work on ...
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