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Yuriko Seino, Flagstaff, US, S Yale St
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Business Profiles
patentbuddy: Yuriko Seino
KABUSHIKI KAISHA TOSHIBA, Yokohama-shi, JP
Private Homepages
Contact hole shrink process using graphoepitaxial directed...
www.spiedigitallibrary.org
SPIE Digital Library Journals
Dissipative particle dynamics simulations to optimize contact hole...
www.spiedigitallibrary.org
SPIE Digital Library Proceedings
Electrical Via Chain Yield for DSA Contact Hole Shrink Process |...
www.semanticscholar.org
H. Kato, Yuriko Seino, +8 authors T. Azuma; Published 25 June 2013; Materials Science; Journal of Photopolymer Science and Technology.
Electrical Via Chain Yield for DSA Contact Hole Semantic Scholar
www.semanticscholar.org
Hirokazu Kato, Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno,. Katsutoshi Kobayashi, Ayako Kawanishi, Tsubasa Imamura, Mitsuhiro Omura, Naofumi. Nakamura and Tsukasa Azuma*. Center for Semiconductor Research & Development, Toshiba Corporation,. 1 Komukai Toshiba-cho, Saiwai-ku, ...
Related Documents
Resist Residue in Ion Implantation Level Lithography - NASA/ADS
ui.adsabs.harvard.edu
Title: Resist Residue in Ion Implantation Level Lithography: Authors: Tomoko Ojima,; Masafumi Asano,; Masanori Takahashi,; Yuriko Seino,; Shoji Mimotogi,
Scientific Publications
Microelectronic Engineering | Micro/Nano Devices and Systems |...
www.sciencedirect.com
Microelectronic Engineering Volume 159, Pages A1-A2, (15 June 2016) ... Yusuke Kasahara, Yuriko Seino, Hironobu Sato, Hideki Kanai, Katsutoshi …
Perpendicular Orientation Control without Interfacial PubMedpubmed.ncbi.nlm.nih.gov › ...
pubmed.ncbi.nlm.nih.gov
Sep 20, · ... Ken Miyagi , Yuusuke Kasahara , Hironobu Sato , Yuriko Seino , Tsukasa Azuma , Hideaki Yokoyama , Christopher K Ober , Teruaki Hayakawa ...
Microelectronic Engineering | Micro/Nano Devices and Systems 2015www.sciencedirect.com › microelectronic-engineering › special-issue
www.sciencedirect.com
Dec 13, · Yusuke Kasahara, Yuriko Seino, Hironobu Sato, Hideki Kanai, ... Tsukasa Azuma. 15 June 2016: Pages : Download PDF. Article preview.
Publications
Yuriko Seino
spie.org
SPIE Profile of Yuriko Seino, EUVL Infrastructure Development Ctr Inc. SPIE Profiles is a networking platform for optics and photonics professionals.
(PDF) A Simulation Study on Defectivity in Directed - Amanote ...research.amanote.com › publication › a-simulation-study-on-defectivity-in-...
research.amanote.com
A Simulation Study on Defectivity in Directed Self-Assembly Lithography by Katsuyoshi Kodera, Hideki Kanai, Hironobu Sato, Yuriko Seino, Katsutoshi.
Sub-45nm resist process using stacked-mask process | (2008) | Seino |...
spie.org
Proceedings Paper Sub-45nm resist process using stacked-mask ... Yuriko Seino, Toshiba Corp. (Japan) Katsutoshi Kobayashi, Toshiba Corp. (Japan) ...
Miscellaneous
US B2 - Method of forming pattern and laminate - Googlewww.google.sr › patents
patents.google.com
... Hiroko Nakamura: Satoshi Mikoshiba: Koji Asakawa: Masahiro Kanno: Yuriko Seino: Tsukasa Azuma; Current Assignee (The listed assignees may be inaccurate.
2015 PST Awardees - SPST- Society of Photopolymer Science and...
www.spst-photopolymer.org
The Best Paper Award. Hirokazu Kato, Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Katsutoshi Kobayashi, Ayako Kawanishi, Tsubasa Imamura ...
2016 Awardees - SPST- Society of Photopolymer Science and Technology
www.spst-photopolymer.org
Photopolymer, Photopolymer Conference, フォトポリマー，フォトポリマーコンファレンス
A simulation study for defects in sub-15 nm line-space using directed...
www.cambridge.org
A simulation study for defects in sub-15 nm line-space using directed self-assembly - Volume 1750
Award-Winning Polymer Science in Japan - ChemistryViews
www.chemistryviews.org
Society of Polymer Science Japan SPSJ Wiley Award presented to Teruaki Hayakawa and Kotaro Satoh .
Diary of an Advanced Lithographer, 2012
www.lithoguru.com
Chris Mack attends the SPIE Advanced Lithography Symposium Here is his daily diary of events and impressions.
February | | Lithoguru
life.lithoguru.com
... February Microlithography. Advanced ... Yuriko Seino of Toshiba showed some amazing results of a DSA contact hole shrink process that looked almost ...
Feasibility of ultra-low k1 lithography for 28nm CMOS nodewww.spiedigitallibrary.org › pdf
www.spiedigitallibrary.org
Fujise, Yuriko Seino, Tatsuhiko Ema, Hiroki Yonemitsu, Manabu Takakuwa,. Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyoh, Hideaki.
Perpendicular Orientation Control without Interfacial Treatment of...
figshare.com
Mar 17, · Yuriko Seino. TA. Tsukasa Azuma. HY. Hideaki Yokoyama. CO. Christopher K. Ober. TH. Teruaki Hayakawa. CATEGORIES.
Perpendicular Orientation Control without Interfacial Treatment of -...
docecity.com
Perpendicular Orientation Control without Interfacial Treatment of...
Publications - Ober Research Groupober.mse.cornell.edu › publications_new
ober.mse.cornell.edu
... Shinya Minegishi, Ken Miyagi, Yuusuke Kasahara, Hironobu Sato, Yuriko Seino, Tsukasa Azuma, Hideaki Yokoyama, Christopher K. Ober, Teruaki Hayakawa,, ...
gradsweb
jan.ucc.nau.edu
Yuriko Seino -- Home Page (TESL) Yusuf Sen -- Home Page (Applied Linguistics) Donna Shelley -- Home Page (Composition Instructor) Latricia Trites -- Home Page ...
The Photopolymer Science and Technology Award - J-STAGE Journals -...
moam.info
Technology, received a M.S. and a Dr. of Eng. in and 2014, respectively Shinya Minegishi received a bachelor (...
yukinor1itasaka following users on Instagram - Orepic
orepic.com
秋場勇希 @yuki_27isl. Tomofumi Yamashina @yamashi 四釜良 @sifuliang feel_free_find @feel_free_find. ともや さとう @ttmmyyy. Yuriko Seino @yulicoc.o. Yasuhiro Saitou @yasuhiro 田村夏海 @natsun25. kozo saito @crafts_milch2. TERRACE HOUSE ( テラスハウス ) @th_6_tv. いたさか まりこ @maaaa52.
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