Wonhui Cho - The Mathematics Genealogy Projectwww.genealogy.math.ndsu.nodak.edu › ...
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Wonhui Cho. Ph.D. University of Texas at Austin UnitedStates. Dissertation: Temperature control and modeling of rapid thermal processing.
CiteSeerX — Temperature Control and Modeling of Rapid Thermal...
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@MISC{Cho_gyeongs., author = {Wonhui Cho and Thomas F. Edgar and David M. Himmelblau and Sanjay K. Banerjee and Si Z. Qin}, title = {Gyeong S. HwangTemperature ...
Closed-loop identification of wafer temperature dynamics in a rapid ...link.springer.com › article
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Wonhui Cho, Thomas F. Edgar & Jietae Lee. Department of Chemical Engineering, Kyungpook National UniversityDaegu, Korea. Jietae Lee. Authors.
Gyeong S. HwangTemperature Control and Modeling of Rapid Thermal...
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By Wonhui Cho, Thomas F. Edgar, David M. Himmelblau, Sanjay K. Banerjee and Si Z. Qin. Abstract.
Closed-loop identification of wafer temperature dynamics in a rapid...
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Closed-loop identification of wafer temperature dynamics in a rapid thermal process ... Wonhui Cho (1) Thomas F. Edgar (1) Jietae Lee (1) (2) Author Affiliations. 1.
Iterative identification of temperature dynamics in single wafer...
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As the standard size of silicon wafers grows and performance specifications of integrated circuits become more demanding, a better control system to improv
All web results to the name "Wonhui Cho"
Improved metal CMP endpoint control by SPIE Digital Librarywww.spiedigitallibrary.org › full
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Improved metal CMP endpoint control by monitoring carrier speed controller output or pad temperature. Peter J. Beckage, Ralf Lukner, Wonhui Cho, ...
Iterative identification of temperature dynamics 한국학술지인용색인www.kci.go.kr › sereArticleSearch › ciSereArtiView
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Wonhui Cho 1 , Thomas F. Edgar 2 , 이지태 /LEE JIE TAE 3. 1University of Texas. 2University of Texas. 3경북대학교. 초록. As the standard size of silicon ...
T F Edgar Department of Chemical Engineering The - SlideToDoc.comslidetodoc.com › t-f-edgar-department-of-chemical-engineering-the
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Sung Bo Hwang: Modeling of Lithography Dry Development and RTCVD of Si. Ge 6. Wonhui Cho: Multivariable Temperature Control in Rapid Thermal Processing.
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+--thermal processor +--thermal uniformity +--university press +--user manual +--vapor deposition +--wafer temperature +--wafers during rapid +--wonhui cho ...
Finn Haugen, "Comparing PI Tuning Methods in a Real Benchmark...
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“Comparing PI Tuning Methods in a Real Benchmark Temperature Control System ... Jietae Lee, Wonhui Cho and Thomas F. Edgar (2013), doi: ie
Iterative identification of temperature dynamics in single wafer...
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Wonhui Cho--- autor Edgar--- Bibliografia. Typ dokumentu. Bibliografia. Identyfikator YADDA. bwmeta1.element.ieee Identyfikatory. YADDA. bwmeta1 ...
Nonlinear Model Identification for Temperature Control in a Single...
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Wonhui Cho, Chemical Engineering, University of Texas, Austin, TX , Thomas F. Edgar, University of Texas at Austin, 1 University Station C0400, Austin, TX
Comparison of controller tuning methods for temperature ...www.spiedigitallibrary.org › full
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K. S. Balakrishnan, Wonhui Cho, and Thomas F. Edgar "Comparison of controller tuning methods for temperature uniformity control in a rapid thermal processor" ...
Iterative identification of temperature dynamics in single wafer ...www.cheric.org › article
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Wonhui Cho, Thomas F. Edgar, and Jietae Lee 1, †. Department of Chemical Engineering, University of Texas, Austin, TX78712, U.S.A., USA; 1Department of ...
Session: # Nonlinear Analysis and Control (10B02)aiche.confex.com › aiche › techprogram
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9:50 AM, 368e, Nonlinear Model Identification for Temperature Control in a Single Wafer Rapid Thermal Processing Wonhui Cho, Thomas F. Edgar, Jietae Lee.
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