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Toshikazu Takayama - Patent Inventor
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List of recent Toshikazu Takayama patent applications
National University Corporation Nara Institute Of Science And...
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Toshikazu Takayama · Toshiyuki Ogata · Tsukasa Mitsui · Yoshihiro Ueoka · Yusuke Nakamura. Browse by year: National ...
Management & Stakeholders
Toshikazu Takayama - MarketVisual Knowledge Map
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New Search: Toshikazu Takayama. Toshikazu Takayama. Knowledge Map Preview. Company Affiliations. Search: Company, # of Roles. TAKAYAMA KOSAN ...
Business Profiles
patentbuddy: Toshikazu Takayama
TOKYO OHKA KOGYO CO., LTD., Kawasaki-shi, JP
Books & Literature
Military planning in the twentieth century : proceedings of the...
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Kono Shiro, Nakamura Teiji, Ohmae Toshikazu, Takayama Shinobu, Toga
Hiroshi ...
Scientific Publications
LandOfFree - Scientist - Toshikazu Takayama
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Publications
Toshikazu Takayama
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SPIE Profile of Toshikazu Takayama, TOK Taiwan Co Ltd. SPIE Profiles is a networking platform for optics and photonics professionals.
Miscellaneous
US A - Method of forming chemically amplified resist pattern...
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A chemically amplified resist pattern is formed by applying chemically amplified resist, forming thereafter a layer of an amorphous polyolefines...
WO A1 - Composition for formation of resist protection film,...
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... WO A1, WO-A , WO A1, WO A1, WO A1. Inventeurs, Keita Ishiduka, Toshikazu Takayama.
DE D1 - Vernetzte, positiv arbeitende...
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Inventors, Katsumi Oomori, Yohei Kinoshita, Tomotaka Yamada, Toshikazu Takayama. Applicant, Tokyo Ohka Kogyo Co Ltd. Export Citation, BiBTeX, EndNote, ...
Progress of topcoat and resist development for 193nm immersion...
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SPIE Digital Library Proceedings
ClaimParse | Patent
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Toshikazu Takayama, Kawasaki (JP) Takayuki Hosono, Kawasaki (JP). Assignee, National University Corporation Nara Institute of Science and Technology, .
EP A1 - Vernetzte, positiv arbeitende...
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A chemical-amplification positive-working photoresist composition of the crosslinked type used for photolithographic patterning works in the manufacture of...
WO A1 - Composition de résine photosensible et procédé de...
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Inventeurs, Kazufumi Sato, Yasushi Fujii, Hisanobu Harada, Koji Yonemura, Isamu Takagi, Daisuke Kawana, Tomotaka Yamada, Toshikazu Takayama.
US A1 - Topcoats for use in immersion lithography...
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US *, 13 Sep 2007, 8 Apr 2010, Toshikazu Takayama, Material for formation of protective film, method for formation of photoresist ...
Takayama, Kanagawa - Patent applications
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Toshikazu Takayama, Kanagawa JP. Patent application number ... Patent applications by Toshikazu Takayama, Kanagawa JP. Yasuo Takayama, Kanagawa JP ...
Sqoop - Utility Patent Grant (B2)
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Inventors: Masanobu Naito, Yusuke Nakamura, Toshiyuki Ogata, Toshikazu Takayama, Takayuki Hosono. A substrate having rod-like ...
Study on the Tunneling Reaction of H Atoms with a Solid Thin Film of...
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COLLAPSE. Kenzo Hiraoka, Tetsuya Sato, Shoji Sato, Toshikazu Takayama, Tatsuya Yokoyama, Norihito Sogoshi, Shinichi Kitagawa ... Toshikazu Takayama.
US A1 - Composition for formation of antireflection film,...
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Inventors, Toshikazu Takayama, Yasushi Fujii, Hisanobu Harada, Koji Yonemura, Isamu Takagi, Daisuke Kawana, Kazufumi Sato. Original ...
US A1 - Method for using a topcoat composition
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US *, 13 Sep 2007, 8 Apr 2010, Toshikazu Takayama, Material for formation of protective film, method for formation of photoresist pattern, and ...
US A - Objective lens system for endoscopes Google...
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An objective optical system for endoscopes comprising, in the order from the object side, a front negative lens unit, an aperture stop, a positive lens...
Toshikazu - Patent applications
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Toshikazu Takayama, Kawasaki-Shi JP. Patent application number ... Patent applications by Toshikazu Takayama, Kawasaki-Shi JP. Toshikazu Tanaka ...
US A1 - Treatment of synthetic quartz glass substrate...
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A synthetic quartz glass substrate having a resist film coated thereon is treated by immersing it in a terpene-containing solvent until the resist film...
EP A4 - Resist composition Google Patents
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... Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu, Toshikazu Tachikawa, Jun Iwashita, Keita Ishiduka, Tomotaka Yamada, Toshikazu Takayama, Masaaki Yoshida.
US B2 - Composition for formation of resist protection film,...
patents.google.com
Erfinder, Keita Ishiduka, Toshikazu Takayama. Ursprünglich Bevollmächtigter, Tokyo Ohka Kogyo Co., Ltd. Zitat exportieren, BiBTeX, EndNote, RefMan.
US A1 - Crosslinked positive-working photoresist...
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The invention discloses a chemical-amplification positive-working photoresist composition of the crosslinked type used for photolithographic patterning...
US B2 - Substrate having rod-like molecules on surface thereof...
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A substrate having rod-like molecules on a surface thereof including: a substrate in which a pattern including a convex portion with a flat upper surface...
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