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LinkedIn: Tatsuro Nagahara - 所長補佐 - J.CLAIR Singapore | LinkedIn
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LinkedIn: Tatsuro Nagahara | LinkedIn
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LinkedIn: 長原Tatsuro Nagahara - R&D manager - Merck Group | LinkedIn
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Interests
Tatsuro Nagahara - Patents
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Tatsuro Nagahara patents Recent bibliographic sampling of Tatsuro Nagahara patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):
Business Profiles
patentbuddy: Tatsuro Nagahara
AZ ELECTRONIC MATERIALS USA CORP., Shizuoka, JP
Books & Literature
Official Gazette of the United States Patent and Trademark Office:...
books.google.md
5,177,578 POLYCRYSTALLINE SILICON THIN FILM AND TRANSISTOR USING THE SAME Hisashi Kakinoki; Tatsuro Nagahara, and Keitaro Fukui, all of Ohi, ...
Music
Full text of "USPTO Patents Application "
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% * 2002JP307 ^ ,527 Applicants) Tatsuro NAGAHARA eWT FOiog Date ...
Related Documents
Advanced shrink material for NTD process with lower Y/X shrinkage...
www.deepdyve.com
Takafumi Kinuta, Tatsuro Nagahara and Shinji Tarutani. Merck Performance Materials Manufacturing G.K Chihama, Kakegawa-shi, Shizuoka...
Negative photo-imageable spin-on dielectrics: report on progress,...
www.deepdyve.com
Tatsuro Nagahara. ‡. , Mark Neisser. †. , and. Ralph R. Dammel. †. †. AZ Electronic Materials USA Corp., 70 Meister Avenue, Somerville, NJ , USA. ‡.
Combinatorial process optimization for negative photo-imageable...
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and Tatsuro Nagahara. ‡. †. AZ Electronic Materials USA Corp., 70 Meister Avenue, Somerville, NJ , USA. ‡. AZ Electronic Materials (Japan) K.K.,
Publications
Mr. Tatsuro Nagahara : SPIE.org Profile
spie.org
SPIE Profile : Mr. Tatsuro Nagahara - the International Society for Optics and Photonics.
Chemical shrink materials and process for negative tone development...
spie.org
Proceedings Paper Chemical ... Author(s): Yoshihiro Miyamoto; John Sagan; Munirathna Padmanaban; Georg Pawlowski; Tatsuro Nagahara. Format Member Price
Resist roughness improvement by a chemical shrink process | (2016) |...
spie.org
Tatsuro Nagahara, Merck Performance Materials Manufacturing G. K. (Japan) Takashi Sekito, Merck Performance Materials Manufacturing ...
Miscellaneous
Tatsuro Nagahara | LinkedIn
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View Tatsuro Nagahara's professional profile on LinkedIn. LinkedIn is the world's largest business network, helping professionals like Tatsuro Nagahara discover ...
EP A1 - Photosensitive polysilazane composition, method of...
patents.google.com
... Tatsuro Nagahara: Candidato: Clariant International Ltd. Esporta citazione: BiBTeX, EndNote, RefMan: Citazioni di brevetti (5), Citazioni diverse da brevetti (2
EP A2 - Utilisation de matieres dielectriques ...
patents.google.com
US A1 * Tatsuro Nagahara Photosensitive polysilazane composition and method of forming patterned polysilazane film.
EP A4 - Verfahren zum formen eines siliciumfilms ...
patents.google.com
US A1 * Tatsuro Nagahara Method for formation of siliceous film and siliceous film formed by the method. Family To ...
Tatsuro Nagahara: Auction prices, signatures and monograms -...
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Art auction results, signatures and monograms of artist Tatsuro Nagahara on Findartinfo
(IITC/MAM 2011) IEEE International Interconnect ...
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... Chien-Hsien Lee, Elizabeth Wolfer and Tatsuro Nagahara, AZ Electronic Materials, Somerville, NJ P1.16 Investigation of Electrical Programmable Metal Fuse ...
A phase segregating polymer blend for 2xnm feature applications
www.spiedigitallibrary.org
SPIE Digital Library Proceedings
US A - Inorganic polysilazane and method of producing the same...
patents.google.com
Novel primarily chain inorganic polysilazanes of average molecular weight of 690 to are prepared from novel adducts of a halosilane and a base by...
US B2 - Medium voltage cable insulation Google...
patents.google.com
Compositions comprising: A. Ethylene-based polymer, e.g., LDPE; B. Polyalkylene glycol, e.g., PEG; C. Tertiary hindered amine stabilizer;...
WO A1 - Photosensitive polysilazane composition, method of...
patents.google.com
Inventeurs, Tatsuro Nagahara, Hideki Matsuo. Déposant, Clariant International Ltd. Exporter la citation, BiBTeX, EndNote, RefMan. Citations de brevets (5), ...
Aqueous materials for advanced lithography (Conference ...
www.spiedigitallibrary.org
Yi Cao, Tatsuro Nagahara, and Taku Hirayama "Aqueous materials for advanced lithography (Conference Presentation)", Proc. SPIE
METHOD FOR FORMATION OF SILICEOUS FILM AND SILICEOUS FILM FORMED BY...
www.patentsencyclopedia.com
Patent application title: METHOD FOR FORMATION OF SILICEOUS FILM AND SILICEOUS FILM FORMED BY THE METHOD Inventors: Tatsuro Nagahara (Shizuoka, JP) Masanobu Hayashi
Nagahara, JP - Patent applications
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Tatsuro Nagahara, Shizuoka JP. Patent application number Description Published; : METHOD FOR FORMATION OF SILICEOUS FILM AND SILICEOUS FILM FORMED BY THE
US B2 - Inorganic resist sensitizer Google Patents
patents.google.com
Tatsuro Nagahara: Photosensitive polysilazane composition and method of forming patterned polysilazane film: US * 25. Nov : 8. Juli 2004: Barton …
US A1 - Color-Pigmented Paint Composition Having High...
patents.google.com
Color-pigmented paint composition having high covering power, increased scratch resistance and easy-to-clean properties Tatsuro Nagahara:
WO A1 - Composition photosensible de polysilazane, procede...
patents.google.com
Tatsuro Nagahara, Hideki Matsuo: Requerente: Clariant Int Ltd, Tatsuro Nagahara, Hideki Matsuo: Exportar citação: BiBTeX, EndNote, RefMan: Citações de Patentes (5 ...
METHOD FOR FORMING INSULATING FILM - Patent ...www.patentsencyclopedia.com › app
www.patentsencyclopedia.com
Inventors: Yusuke Takano (Tokyo, JP) Yusuke Takano (Tokyo, JP) Tatsuro Nagahara (Shizuoka, JP) Shinde Ninad (Shizuoka, JP) Takafumi ...
Microsoft Word - ver3-17 ICPST33プログラム fin5 - PDF 無料ダウンロード
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... Industries A-06 Extension of 193nm lithography by chemical shrink process Takashi Sekito, Yuriko Matsuura, Tatsuro Nagahara, Merck Performance Materials ...
US A1 - Silicon oxynitride film formation method and...
patents.google.com
The present invention provides a silicon oxynitride film formation method capable of reducing energy cost, and also provides a substrate equipped with a...
US A1 - Photosensitive composition for interlayer...
patents.google.com
Inventor: Tatsuro Nagahara: Hideki Matsuo; Original Assignee: Tatsuro Nagahara: Hideki Matsuo; Priority date. The priority date is an assumption and is not a ...
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