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Shintaro Aoyama, 59, Dallas, PO Box *****
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One of the largest people directories for white pages information. Shintaro Aoyama (Age 57) living in Plano, TX ( )
Interests
Shintaro Aoyama - Patents
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Recent bibliographic sampling of Shintaro Aoyama patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):
Tokyo Electron Limited patent inventors (2015)
stks.freshpatents.com
Shinji Wakabayashi · Shinji Wakabayashi · Shinji Wakabayashi · Shinji Wakabayashi · Shinjiro Watanabe · Shinobu Miyazaki · Shintaro Aoyama · Shintaro Sugihara · Shinya Kikuta · Shinya Kikuta · Shinya Shima · Shogo Hara · Shogo Mizota · Shoichiro Matsuyama · Shoso Shinguhara · Shota Yoshimura · Shota Yoshimura.
Business Profiles
patentbuddy: Shintaro Aoyama
TOKYO ELECTRON LIMITED
Books & Literature
Advanced Gate Stack, Source/drain, and Channel Engineering for...
books.google.nl
, copyright The Electrochemical Society Control of Material Interactions in Advanced High-κ Metal Gate Stacks Cory Wajda,a Gert Leusink,a Koji Akiyama, b Shigeo Ashigaki, b Shintaro Aoyama, b Kouji Shimomura, b Miki Aruga, b Tsuyoshi Takahashi, b Kazuyoshi Yamazaki, b Hideaki Yamasaki b a TEL ...
Miscellaneous
US A1 - Method for reducing by-product deposition in wafer...
patents.google.com
A method of reducing by-product deposition inside wafer processing equipment includes providing a chamber having a peripheral inner wall and placing a...
US A - Apparatus and method for surface treatment
patents.google.com
An apparatus and method for surface treatment of a substance to be processed, which are capable of decreasing the number of foreign matters holding on...
US B2 - Multi-layer dielectric containing diffusion barrier...
patents.google.com
A method for forming a dielectric is disclosed. The method comprises forming a first dielectric layer over semiconductor material. A diffusion barrier...
Stream Shintaro Aoyama | Listen to jap playlist online for free on...
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Listen to jap, a playlist curated by Shintaro Aoyama on desktop and mobile.
Stream Shintaro Aoyama | Listen to アーメン playlist online for free on...
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Listen to アーメン, a playlist curated by Shintaro Aoyama on desktop and mobile.
Texture Analysis of Si(100) and Si(111) Surfaces Using Autocovariance...
www.cambridge.org
417 TEXTURE ANALYSIS OF Si(100) AND Si(111) SURFACES USING AUTOCOVARIANCE OF AFM IMAGES SHINTARO AOYAMA AND TADAHIRO OHMI …
US B2 - Manufacturing method of semiconductor device
patents.google.com
According to one embodiment, a manufacturing method of semiconductor device includes forming plural elements on a substrate, forming a silicon compound...
WO A1 - Plasma igniting method and substrate processing...
patents.google.com
Inventors, Masanobu Igeta, Kazuyoshi Yamazaki, Shintaro Aoyama, Hiroshi Shinriki. Applicant, Tokyo Electron Limited. Export Citation, BiBTeX, EndNote, ...
WO A2 - Method and system for forming an oxynitride layer by...
patents.google.com
US *, 28 Set 2001, 23 Ago 2005, Texas Instruments Incorporated, Method for transistor gate dielectric layer with uniform nitrogen concentration. US *, 18 Jul 2001, 5 Fev 2004, Shintaro Aoyama, Method for manufacturing semiconductor device, substrate treater, and substrate treatment system ...
Method of Substrate Treatment, Computer-Readable Recording Medium,...
www.patentsencyclopedia.com
Patent applications by Shintaro Aoyama, Yamanashi JP. Patent applications by Tokyo Electron Limited. Patent applications in class Insulative material having impurity
FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM - Patent application
www.patentsencyclopedia.com
Patent application title: FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM Inventors: Shintaro Aoyama (Nirasaki-Shi, JP) Tsuyoshi Takahashi (Nirasaki-Shi, JP) …
Aoyama - Patent applications
www.patentsencyclopedia.com
Shintaro Aoyama, Kohfu-City JP. Patent application number, Description, Published ... Shintaro Aoyama, Nirasaki JP. Patent application number, Description ...
WO A1 - Procede de formation d'un film d'isolant de grille,...
patents.google.com
This film forming method comprises a first step of forming a first insulation film the essential component of which is a material having a first dielectric...
US B1 - Segmented contactor Google Patents
patents.google.com
A method of fabricating a large area, multi-element contactor. A segmented contactor is provided for testing semiconductor devices on a wafer that...
WO A1 - 成膜装置、成膜方法および記録媒体 Google Patents
patents.google.com
被処理基板を内部に保持する処理容器と、前記処理容器内に、ターシャリブトキシル基を配位子とする金属アルコキシドよりなる第１の気相原料を供給する第１のガス供給手段と、前記処理容器内に、シリコンアルコキシド原料よりなる第２の気相原料を供給する第２のガス供給手段と、を有し、前記第１のガス供給手段と前記第２のガス供給手段は、前記...
Shintaro - Patent applications
www.patentsencyclopedia.com
Shintaro Aoyama, Yamanashi-Ken JP. Patent application number Description Published; : Formation of Gate Insulation Film - A method of forming a gate
WO A1 - Method and system for forming an oxynitride layer...
patents.google.com
2004, Shintaro Aoyama, Method for manufacturing semiconductor device, substrate treater, and substrate treatment system. US *, 22 jaan.
WO A1 - Method for film formation of gate insulator,...
patents.google.com
This film forming method comprises a first step of forming a first insulation film the essential component of which is a material having a first...
WO A1 - ゲート絶縁膜の形成方法、記憶媒体、及びコンピュータプログラム Google...
patents.google.com
ＳｉＯ２容量換算膜厚が１．４５ｎｍ以下のハフニウムシリケート系材料からなるゲート絶縁膜４をシリコン基板１上に形成する方法が開示される。この方法は、シリコン基板１の表面を洗浄し実質的に酸素が存在しない清浄面にする工程と、アミド系有機ハフニウム化合物とシリコン含有原料とを用いたＣＶＤプロセスにより、シリコン基板１の清浄面に...
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