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Register for the 5th HRSMC Photochemistry Summerschool 2016scg.ch › scg-news › 87-news-photochemistry

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A guest lecture on Photolithography will be delivered by Dr. Roel Gronheid (IMEC, Leuven, Belgium). Early Bird Registration until June 16,

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Interviewees include consultant Wolfgang Arden, Rolf Seltmann of Globalfoundries, and IMEC's Roel Gronheid. More>> Share: Facebook ...

DSA, EUV, Nanopatterning are Top themes at SPIE Advanced ...www.prweb.com › releases › › prweb

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Mar 7, — "This is where you meet your peers, everybody that matters in this business,” said Roel Gronheid of IMEC. More than 2,360 researchers, ...

Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo ...onlinelibrary.wiley.com › doi › abs › adma

onlinelibrary.wiley.com

Sep 30, — Roel Gronheid,. Roel Gronheid. Imec vzw, Kapeldreef 75, B Leuven, Belgium. Search for more papers by this author.

Directed Self-assembly of PS-b-PMMA with Ionic Liquid Additionpdfs.semanticscholar.org › ...

pdfs.semanticscholar.org

by X Chen · Cited by 5 — Paulina Rincon-Delgadillo, Roel Gronheid. (IMEC, Belgium). Takehito Seo, Tasuku Matsumiya, Katsumi Ohmori,Takaya Maehashi, Akiya Kawaue. (TOK, Japan) ...

a b c dwww.phantomsnet.net › Abstracts › LITHO2006_K_Gronheid

www.phantomsnet.net

Roel Gronheid, Kurt Ronse. IMEC, Kapeldreef 75, B Leuven, Belgium. Over the past two years, 193nm immersion lithography has clearly emerged on the ...

White Papers - Fabtechwww.fabtech.org › white_papers › wafer_processing

www.fabtech.org

01 June | Edition 34, Wafer Processing. Monique Ercken, Roel Gronheid, Ivan Pollentier & Philippe Leray, IMEC, Leuven, Belgium Read more >> ...

Using K LUP for Understanding Trends in EUV Resist Performancewww.jstage.jst.go.jp › article › photopolymer › _article

www.jstage.jst.go.jp

Roel Gronheid, Frieda Van Roey, David Van Steenwinckel. Author information. Roel Gronheid. IMEC vzw. Frieda Van Roey. IMEC vzw. David Van Steenwinckel.

bol.com: Belgium) Gronheid, Roel (IMEC artikelen kopen? Kijk snel! - Bol.comwww.bol.com › belgium-gronheid-roel-imec

Directed Self-assembly of Block Co-polymers for Nano-manufacturing. Roel Gronheid · Directed Self-assembly of Block Co-polymers for Nano-manufacturing.

by KLA Corporation - Issuuissuu.com › kla-tencor › docs

issuu.com

Sep 17, — EUV SECONDARY ELECTRON BLUR AT THE 22NM HALF PITCH NODE Roel Gronheid, IMEC, Kapeldreef 75, B Leuven, Belgium Todd R. Younkin, ...

Dynamic leaching procedure on an immersion interference printer |...

spie.org

Proceedings Paper Dynamic leaching procedure on an immersion ... Roel Gronheid, IMEC (Belgium) Enrico Tenaglia, IMEC (Belgium) STMicroelectronics (United ...

Will directed self-assembly pattern 14nm DRAM? | Coventor

www.coventor.com

This is because, as Roel Gronheid from IMEC pointed out last month at the SPIE Advanced Lithography conference [1], memory chips can tolerate single failing cells through redundancy and so can could tolerate higher defectivity in patterning (roughly 1 defect/cm 2 compared to defect/cm 2 for logic). Defectivity rates for DSA aren’t there yet (according to public information), but are ...

SPIE Advanced Lithography nanotoolswww.nanotools.com › blog › spie-al-2016

www.nanotools.com

Characterization of EUV dissolution properties by DRM methodeuvlsymposium.lbl.gov › pdf › pres

euvlsymposium.lbl.gov

by C Fonseca · · Cited by 1 — Tokyo Electron, Ltd. Gustaf Winroth, Roel Gronheid. IMEC. International Symposium on EUV Lithography. Kobe, Japan. October 20,

Fabrication of 28nm pitch Si fins with DSA lithography - Academia.eduwww.academia.edu › ...

www.academia.edu

ACKNOWLEDGMENTS The authors would like to express their appreciation to Roel Gronheid and the rest of the DSA team at IMEC for their invaluable expertise ...

Spatially-controllable and uniform photochemical transfer printing of ...experts.umn.edu › publications › spatially-controllable-and-uniform-photo...

experts.umn.edu

by DW Janes · — The authors thank Roel Gronheid, Paulina Rincon, Hari Pathangi, Nadia Vandenbroeck, and Boon Teik Chan of Imec vzw for providing chemically nanopatterned ...

Carlos Fonseca
Paul Nealey
Chun Zhou

Philippe Leclère
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Roel Gronheid and Imec Free People Check

Register for the 5th HRSMC Photochemistry Summerschool 2016scg.ch › scg-news › 87-news-photochemistry

EIQ Daily

DSA, EUV, Nanopatterning are Top themes at SPIE Advanced ...www.prweb.com › releases › › prweb

Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo ...onlinelibrary.wiley.com › doi › abs › adma

Directed Self-assembly of PS-b-PMMA with Ionic Liquid Additionpdfs.semanticscholar.org › ...

a b c dwww.phantomsnet.net › Abstracts › LITHO2006_K_Gronheid

White Papers - Fabtechwww.fabtech.org › white_papers › wafer_processing

Using K LUP for Understanding Trends in EUV Resist Performancewww.jstage.jst.go.jp › article › photopolymer › _article

bol.com: Belgium) Gronheid, Roel (IMEC artikelen kopen? Kijk snel! - Bol.comwww.bol.com › belgium-gronheid-roel-imec

by KLA Corporation - Issuuissuu.com › kla-tencor › docs

Dynamic leaching procedure on an immersion interference printer |...

Will directed self-assembly pattern 14nm DRAM? | Coventor

SPIE Advanced Lithography nanotoolswww.nanotools.com › blog › spie-al-2016

Characterization of EUV dissolution properties by DRM methodeuvlsymposium.lbl.gov › pdf › pres

Fabrication of 28nm pitch Si fins with DSA lithography - Academia.eduwww.academia.edu › ...

Spatially-controllable and uniform photochemical transfer printing of ...experts.umn.edu › publications › spatially-controllable-and-uniform-photo...

blog - nanotools AFM probeswww.nanotools.com › blog

Roughness characterization in the frequency domain and linewidth...

Defect reduction and defect stability in IMEC's 14nm half-pitch...

EUV Symposium 2012euvlsymposium.lbl.gov › pdf › pres

IMEC has plenty for show and tell - News

SPIE Advanced Lithography Symposium – day 1 | Lithoguru

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