US A1 - Substrate processing method and substrate...
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A substrate processing method by which a desired thin film is formed on a substrate by alternately supplying and discharging a plurality of processing...
US A1 - Semiconductor Device Producing Method and Substrate...
patents.google.com
Disclosed is a producing method of a semiconductor device including: loading at least one substrate into a processing chamber; forming a metal oxide film...
US A1 - Method and apparatus for forming silicon oxide film...
patents.google.com
A silicon oxide film is formed on a target substrate by CVD, in a process field configured to be selectively supplied with an Si-containing gas, an...
Semiconductor Device Producing Method and Substrate Processing...
www.patentsencyclopedia.com
Patent application title: Semiconductor Device Producing Method and Substrate Processing Apparatus Inventors: Hironobu Miya (Toyama, JP) Kazuhiro Hirahara …
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1 - REGULAR PAPERS, SHORT...
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... Si Substrate AU Hironobu Miya, Ryota Sasajima, Eiko Takami, Naoto Nakamura and Takayuki Takahagi PP $$ LA eng TE Interface-Trap-Assisted ...
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS - Patent...
www.patentsencyclopedia.com
Inventors: Hironobu Miya (Toyama, JP) Yuji Takebayashi (Toyama, JP) Masanori Sakai (Toyama, JP) Shinya Sasaki (Toyama, JP) Hirohisa ...
US A1 - Method of producing semiconductor device
patents.google.com
Disclosed is a producing method of a semiconductor device comprising a first step of supplying a first reactant to a substrate to cause a ligand-exchange...
EP A1 - Method for cleaning of semiconductor processing...
patents.google.com
A cleaning method for a processing chamber of semiconductor substrates is provided which is capable of rapidly removing deposits and accretions generated...
US A1 - Substrate processing apparatus, method for...
patents.google.com
There is provide a substrate processing apparatus, comprising: a processing chamber configured to house a plurality of substrates with a laminated film...
Substrate Processing System - Patent application
www.patentsencyclopedia.com
Hironobu Miya (Toyama, JP) Afsuhiko Suda (Toyama, JP) Hirohisa ...
US A - Apparatus for chemical vapor deposition and method of...
patents.google.com
... of Semiconductor Device. US *, 24 Feb 2011, Hironobu Miya, Substrate processing apparatus and producing method of semiconductor device ...
WO A1 - Substrate treating apparatus and semiconductor...
patents.google.com
Inventors, Hironobu Miya, Norikazu Mizuno, Takaaki Noda, Masanori Sakai, Taketoshi Sato. Applicant, Hitachi Int Electric Inc, Hironobu Miya, ...
US B2 - Semiconductor device producing method Google...
patents.google.com
Disclosed is a producing method of a semiconductor device, including: loading at least one substrate formed on a surface thereof with a tungsten film...
WO A1 - Method for manufacturing semiconductor device...
patents.google.com
Disclosed is a method for manufacturing a semiconductor device, which comprises a step for carrying at least one substrate on the surface of which a...
US B2 - Semiconductor device producing method and substrate...
patents.google.com
Disclosed is a producing method or a semiconductor device including: loading at least one substrate into a processing chamber; forming a metal oxide film...
US B2 - Substrate processing system Google Patents
patents.google.com
Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a...
WO A1 - Production method for semiconductor device and...
patents.google.com
A production method for a semiconductor device comprising the first step of supplying a first reaction material to a substrate housed in a processing...
WO A1 - Procédé de fabrication de dispositif semiconducteur...
patents.google.com
Disclosed is a method for manufacturing a semiconductor device, which comprises a step for introducing at least one substrate into a process chamber, a step...
WO A1 - Semiconductor device manufacturing method and...
patents.google.com
A semiconductor device manufacturing method is provided with a step of carrying a substrate into a process chamber; a step of forming a thin film on the...
US A1 - Substrate processing apparatus and producing method...
patents.google.com
Disclosed is a substrate processing apparatus, comprising a processing chamber, a holder to hold at least a plurality of product substrates, a heating...
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