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Edita Tejnil, 46, Berkeley, US, Hearst Ave
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Edita Tejnil, 46, Berkeley, US, Prospect St
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Edita Tejnil, 46, Cupertino, US, Mello Pl
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Edita Tejnil, 46, Palo Alto, US, Park Blvd
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Interests
EDITA TEJNIL - Patents
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EDITA TEJNIL patents. Recent bibliographic sampling of EDITA TEJNIL patents listed/published in the public domain by the USPTO (USPTO Patent Application ...
Business Profiles
patentbuddy: EDITA TEJNIL
INTEL CORPORATION, San Carlos, CA, US
Private Homepages
Edita Tejnil's Email & Phone - Mentor Graphics Corporation - San...
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Edita Tejnil's Email. Show email and phone number. San Francisco Bay Area. Sr. Product Engineer @ Mentor Graphics Corporation. Sr. Imaging...
Books & Literature
EUV Lithography - Vivek Bakshi - Google Books
books.google.de
... Bernice Lum, Andy Neureuther, David Newmark, Khanh Nguyen, Bill Oldham, Edita Tejnil, Alfred Wong. University of Central Florida/CREOL: Kenneth Beck, Howard Bender, C. De- Priest, Ann Marie Eligon, Kai Gabel, Art Hanzo, Jim Harvey, Fing Jin, M. A. Klos- ner, Donna O'Connell, Martin Richardson, G. Shimkaveg, ...
Official Gazette of the United States Patent and Trademark Office:...
books.google.dk
... Kenneth Alan Goldberg , Berkeley , and Edita Tejnil , San Carlos , all of Calif . , assignors to The Regents of the University of California , Oakland , Calif .
USPTO Image File Wrapper Petition Decisions Google Books
books.google.dk
... PC P.O.BOX MINNEAPOLIS MN COPY MAILED AUG In re Application of OFFICE OF PETITIONS EDITA TEJNIL Application No.
Frequency-conversion Optics for 213-nm Optical Lithography Light...
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Edita Tejnil pages. 0 Reviewshttp://books.google.com/books/about/Frequency_conversion_Optics_for_213_nm_O.html?id=v1ZEHQAACAAJ ...
Related Documents
Save Better Off Ted - Petition signatures - Page: 213
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Electronic petition signatures: Save Better Off Ted, Page: 213, Background: The e-signatures on this page are volunteered by those who have signed the...
[PDF] advanced lithography - Free Download PDF
pdfsecret.com
bruce W. Smith, Rochester Institute of technology. John L. Sturtevant of texas at Austin. Anthony
Accurate, full chip 3D electromagnetic field model for non ...www.deepdyve.com › spie
www.deepdyve.com
Lam, Michael, Chris Clifford, Michael Oliver, David Fryer, Edita Tejnil, and Kostas Adam. "Accurate, full chip 3D electromagnetic field model for ...
Heuristics for truncating the number of optical kernels in Hopkins...
www.deepdyve.com
Image Calculations for Model-Based OPC Treatment. Christian Zuniga, Edita Tejnil. ASML MaskTools, Great America Parkway Suite ABSTRACT.
Publications
Dr. Edita Tejnil - spie.org
spie.org
Sign In to send a private message or view contact details. Upcoming Presentations Most Recent ...
Advanced mask process modeling for 45-nm and 32-nm nodes | (2008) |...
spie.org
Advanced mask process modeling for 45-nm and 32-nm nodes (Proceedings Paper) Author(s): Edita Tejnil; Yuanfang Hu; Emile Sahouria; Steffen Schulze; ...
Actinic EUVL mask blank defect inspection system | (1999) | Jeong |...
spie.org
Author(s): Seongtae Jeong; Lewis E. Johnson; Yun Lin; Senajith Rekawa; Pei-yang Yan; Patrick A. Kearney; Edita Tejnil; James H. Underwood; Jeffrey Bokor ...
EUV mask pilot line at Intel Corporation | (2004) | Stivers |...
spie.org
Author(s): Alan R. Stivers; Pei-Yang Yan; Guojing Zhang; Ted Liang; Emily Y. Shu; Edita Tejnil; Barry Lieberman; Rajesh Nagpal; Kangmin Hsia; Michael Penn; Fu-Chang Lo
Video & Audio
RealVoters Pinpoint Voters and Votes in Cupertino CA
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RealVoters Voter Predictions with Pinpoint Accuracy for California
Miscellaneous
Edita Tejnil | LinkedIn
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View Edita Tejnil's professional profile on LinkedIn. LinkedIn is the world's largest business network, helping professionals like Edita Tejnil discover inside ...
US B2 - Method of performing multiple stage model calibration...
patents.google.com
A method of calibrating a simulation model of a photolithography process. The method includes the steps of defining a set of input data; defining a...
US B2 - Controlling shape of a reticle with low friction film...
patents.google.com
In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin...
US B2 - Method and apparatus for determining an optical model...
patents.google.com
US *, 14 août 2007, 20 mars 2008, Edita Tejnil, Method, program product and apparatus for creating optimal test patterns for optical model ...
Edita Tejnil | University of California, Berkeley - Academia.edu
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Edita Tejnil Mello Pl, Cupertino, Ca Arivify.comwww.arivify.com › California › Cupertino
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Property details for Mello Pl, located in Cupertino, California. This property is owned by Edita Tejnil.
1 public record of Edita Tejnil - Find Phone, Email, Address ...www.locatepeople.org › edita-tejnil
www.locatepeople.org
Name: Edita Tejnil; Address: 682 Flannery St Santa Clara, CA ; Age: 20 years old; Homeowner: Homeowner; Dwelling Type: Single Family Dwelling Unit ...
People Index Edita Rapaliene - Edita Zemgulyte | Masterseek
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Edita Taraskeviciute - Edita Teivis... Edita Tejnil - Edita Terek · Edita Terzic - Edita Thompson · Edita Thyrestrup - Edita Tmava · Edita Todorovic - Edita Tomory · Edita Toney - Edita Torrrens Ferrer · Edita Tosmuk - Edita Treigyte · Edita Trescakova - Edita Tunovic · Edita Turk - Edita Ubaldina Gallay ... Edita Ucha - Edita Union ...
EP B1 - Method for making an optical pellicle Google...
patents.google.com
US B2 * Surface Logix Inc. Apparatus and method for handling membranes. US A1 * Edita Tejnil Assembling pellicle frames and photomasks. US B2 * Asml Netherlands B.V. Method for bonding a pellicle to a patterning ...
US B2 - Use of soft adhesive to attach pellicle to reticle...
patents.google.com
A pellicle is attached to a reticle by a soft adhesive. The distortion of the reticle is less than if a hard adhesive were used
US B1 - Phase-shifting point diffraction interferometer grating...
patents.google.com
In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order...
Characterization of defect detection sensitivity in inspection of...
www.spiedigitallibrary.org
SPIE Digital Library Proceedings
Accurate, full-chip, three-dimensional electromagnetic field model...
www.growkudos.com
Accurate, full-chip, three-dimensional electromagnetic field model for non-Manhattan mask corners. Michael C. Lam, Chris Clifford, Mike Oliver, David Fryer, Edita Tejnil, Kostas Adam. Journal of Micro/Nanolithography MEMS and MOEMS, February 2016, SPIE; DOI: jmm The author haven't yet ...
US B2 - Eigen decomposition based OPC model Google...
patents.google.com
US *, 30 aug 2007, 6 maart 2008, Edita Tejnil, Method, program product and apparatus for modeling resist development of a lithography process. US *, 19 dec 2008, 11 juni 2009, Robert John Socha, Method, program product and apparatus for model based geometry decomposition for use in a ...
WO A2 - Optical assist feature for two-mask exposure...
patents.google.com
The present invention claims a binary mask printing a product feature which includes a narrow space; and a phase-shifting mask having an assist feature...
EUV Lithography Lights Path to Next-Generation Semiconductors | News...
www.photonics.com
BERKELEY, Calif., Feb The first full-scale prototype machine has been completed that demonstrates critical capabilities for making computer chip
US A1 - Method and apparatus for determining a process...
patents.google.com
An embodiment provides systems and techniques for determining a process model. During operation, the system may receive a first optical model which...
US B2 - Method to inspect patterns with high resolution...
patents.google.com
Inspecting a patterned surface using photoemission of electrons includes selecting materials of the patterned surface, selecting a light source to...
US B2 - Method of compensating for etch effects in...
patents.google.com
US *, 30 Dec 2000, 4 Jul 2002, Edita Tejnil, For use in semiconductor integrated circuit (IC) manufacturing. JPS A *, Title not available ...
Pattern inspection of EUV masks using DUV lightwww.spiedigitallibrary.org › conference-proceedings-of-spie › full
www.spiedigitallibrary.org
Ted Liang, Edita Tejnil, and Alan R. Stivers "Pattern Inspection of EUV Masks Using DUV Light", Proc. SPIE 4889, 22nd Annual BACUS Symposium on ...
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